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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/9395

Title: Impact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution deposition
Authors: Van Elshocht, S.
HARDY, An
Adelmann, Christoph
Caymax, M.
Conard, T.
Franquet, A.
Richard, O.
VAN BAEL, Marlies
MULLENS, Jules
De Gendt, S.
Issue Date: 2008
Publisher: ELECTROCHEMICAL SOC INC
Citation: JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 155(4). p. G91-G95
Abstract: Alternative high-k materials are being researched for future dielectrics in various complementary metal oxide semiconductor applications. We report on the aqueous chemical solution deposition technique as an alternative material screening technique. We used ZrO2 as a reference material to explore the effect of different process parameters on the electrical performance of Pt-dot capacitors. We studied the effects of varying the molar ratio between citric acid and the Zr ions, as well as the conditions of the oxidizing postdeposition anneal. We found that proper optimization of these parameters can significantly reduce the amount of carbon in the layers and enhance the electrical performance of the films to similar levels as atomic layer deposition. (C) 2008 The Electrochemical Society.
Notes: [Van Elshocht, S.; Adelmann, C.; Caymax, M.; Conard, T.; Franquet, A.; Richard, O.; De Gendt, S.] IMEC, B-3001 Heverlee, Belgium. [Hardy, A.; Van Bael, M. K.] Hasselt Univ, Inst Mat Res Inorg & Phys Chem, B-3590 Diepenbeek, Belgium. [Hardy, A.] XIOS Hogesch Limburg, Dept IWT, B-3590 Diepenbeek, Belgium. [Van Bael, M. K.] IMEC, Div IMOMEC, B-3590 Diepenbeek, Belgium. [De Gendt, S.] Univ Louvain, Dept Chem, B-3001 Louvain, Belgium.
URI: http://hdl.handle.net/1942/9395
DOI: 10.1149/1.2840628
ISI #: 000253761700053
ISSN: 0013-4651
Category: A1
Type: Journal Contribution
Validation: ecoom, 2009
Appears in Collections: Research publications

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