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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/8549

Title: Surface characterisation of silicon substrates seeded with diamond nanoparticles under UHV annealing
Authors: Arnault, J.C.
Saada, S.
WILLIAMS, Oliver
HAENEN, Ken
Bergonzo, P.
NESLADEK, Milos
Polini, R.
Osawa, E.
Issue Date: 2008
Publisher: WILEY-V C H VERLAG GMBH
Citation: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 205(9). p. 2108-2113
Abstract: The thermal stability of Ultra Dispersed Diamond on silicon surfaces has been investigated. Samples have been annealed under Ultra-High Vacuum conditions. The evolution of the carbon binding states at the surface has been monitored sequentially by XPS and XEELS. After annealing at 1173 K, sp(3) seeds present initially have been significantly modified. Contrary to lower temperature, no diamond has been detected either by XPS or by FEG-SEM after a short growth step. XPS spectra indicate the formation of silicon carbide. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Notes: [Arnault, J. C.; Saada, S.; Bergonzo, P.; Nesladek, M.] CEA, LIST, Diamond Sensor Lab, F-91191 Gif Sur Yvette, France. [Williams, O. A.; Haenen, K.] Hasselt Univ, Inst Mat Res IMO, Diepenbeek, Belgium. [Williams, O. A.; Haenen, K.] IMEC VZW, Div IMOMEC, Louvain, Belgium. [Polini, R.] Univ Roma Tor Vergata, Dipartimento Sci & Tecnol Chim, I-00173 Rome, Italy. [Osawa, E.] Shinshu Univ, Asama Res Extens Ctr, Nano Carbon Res Inst Ltd, Nagano, Japan.
URI: http://hdl.handle.net/1942/8549
DOI: 10.1002/pssa.200879728
ISI #: 000259653700002
ISSN: 1862-6300
Category: A1
Type: Journal Contribution
Validation: ecoom, 2009
Appears in Collections: Research publications

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