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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/8545

Title: Diamond nanoseeding on silicon: Stability under H-2 MPCVD exposures and early stages of growth
Authors: Arnault, J.C.
Saada, S.
Bergonzo, P
Osawa, E.
Issue Date: 2008
Citation: DIAMOND AND RELATED MATERIALS, 17(7-10). p. 1143-1149
Abstract: Detonation nanodiamond dispersed on silicon surfaces underwent different H-2 MPCVD exposures. The induced changes at the surface have been characterized in situ by XPS and XEELS. Then, a short CH4/H-2 growth step was applied. This sequential study revealed an excellent stability of detonation nanodiamond. The sp(3) etching rate is insufficient to remove nanodiamond even under intense H-2 plasma. The H-2 exposure could be successfully used to remove C-C sp(2) carbon without altering sp(3) seeds. Moreover, the formation of silicon carbide observed after the hydrogen treatment is thought to be helpful to enhance the adhesion of nanodiamond particles on the substrate. (C) 2008 Elsevier B.V. All rights reserved.
Notes: [Arnault, J. C.] CEA Saclay Gif sur Yvette, CEA DSM DRECAM SPCSI, Gif Sur Yvette, France. [Saada, S.; Nesladek, M.; Bergonzo, P.] CEA Saclay Gif sur Yvette, CEA LIST, Gif Sur Yvette, France. [Nesladek, M.; Williams, O. A.; Haenen, K.] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Williams, O. A.; Haenen, K.] IMEC VZW, Div IMOMEC, B-3590 Diepenbeek, Belgium. [Osawa, E.] Shinshu Univ, Asama Res Exens Ctr, NanoCarbon Res Inst Ltd, Matsumoto, Nagano, Japan.
URI: http://hdl.handle.net/1942/8545
DOI: 10.1016/j.diamond.2008.01.008
ISI #: 000259598300022
ISSN: 0925-9635
Category: A1
Type: Journal Contribution
Validation: ecoom, 2009
Appears in Collections: Research publications

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