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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/8139

Title: Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale
Authors: DE CEUNINCK, Ward
D'Haeger, V
Stulens, Herwig
DE SCHEPPER, Luc
STALS, Lambert
Issue Date: 1994
Publisher: MATERIALS RESEARCH SOC
Citation: Murarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668.
Series/Report: MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Notes: LIMBURGS UNIV CENTRUM, INST MAT RES, DIV MAT PHYS, DIEPENBEEK, B-3590 BELGIUM.
URI: http://hdl.handle.net/1942/8139
ISI #: A1994BB59J00086
ISBN: 1-55899-237-5
ISSN: 0272-9172
Type: Proceedings Paper
Appears in Collections: Research publications

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