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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3253

Title: Design of a new test structure for the study of electromigration with early resistance change measurements
Authors: DE CEUNINCK, Ward
MANCA, Jean
D'Haeger, V
VAN OLMEN, Jan
DE SCHEPPER, Luc
STALS, Lambert
Issue Date: 1997
Publisher: Elsevier Science Ltd.
Citation: MICROELECTRONICS AND RELIABILITY, 37(12). p. 1813-1816
Abstract: A new test structure has been designed in order to perform accurate early resistance change measurements in metal lines submitted to high current stress. This test structure integrates both advantages of the so-called ''absolute'' and ''bridge'' techniques, resulting in accurate resistance measurements with a high resolution for both the current-stressed and reference strip. Due to the improved measurement configuration, the aging kinetics of a metal line under current stress can be studied in more detail. (C) 1997 Elsevier Science Ltd.
Notes: DeCeuninck, W, LIMBURG UNIV CTR,INST MAT RES IMO,DIV MAT PHYS,WETENSCHAPSPK,B-3590 DIEPENBEEK,BELGIUM.
URI: http://hdl.handle.net/1942/3253
DOI: 10.1016/S0026-2714(97)00014-0
ISI #: A1997YJ55000003
ISSN: 0026-2714
Type: Journal Contribution
Appears in Collections: Research publications

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