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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3219

Title: Overview of the kinetics of the early stages of electromigration under low (= realistic) current density stress
Authors: VAN OLMEN, Jan
MANCA, Jean
DE CEUNINCK, Ward
DE SCHEPPER, Luc
VAN OLMEN, Jan
D'Haeger, V
Witvrouw, A
Maex, K
Issue Date: 1998
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Citation: MICROELECTRONICS AND RELIABILITY, 38(6-8). p. 1009-1013
Abstract: The early stages of electromigration (EM) have been studied under realistic, i.e. low current densities (j<0.5 MA/cm(2)) using a high resolution resistance measurement technique. I,ow current densities initiate EM and discard other masking mechanisms allowing an accurate observation of the EM kinetics, revealing fundamental features such as incubation time and subsequent linear resistance increase, important for modelling and life time extrapolation purposes. Current and temperature dependences are investigated and compared with the results obtained with high current density tests. For the first time it is shown that the processes responsible for the incubation time are reversible in nature. (C) 1998 Elsevier Science Ltd. tall rights reserved.
Notes: Limburgs Univ Centrum, Inst Mat Res, Div Mat Phys, B-3590 Diepenbeek, Belgium. IMEC, B-3001 Heverlee, Belgium.Van Olmen, J, Limburgs Univ Centrum, Inst Mat Res, Div Mat Phys, Wetenschapspark 1, B-3590 Diepenbeek, Belgium.
URI: http://hdl.handle.net/1942/3219
DOI: 10.1016/S0026-2714(98)00101-2
ISI #: 000076454300026
ISSN: 0026-2714
Type: Journal Contribution
Validation: ecoom, 1999
Appears in Collections: Research publications

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