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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/28707

Title: Qualification of an Ultrasonic Instrument for Real-Time Monitoring of Size and Concentration of Nanoparticles during Liquid Phase Bottom-Up Synthesis
Authors: van Groenestijn, Gert Jan
Meulendijks, Nicole
van Ee, Renz
Volker, Arno
van Neer, Paul
Buskens, Pascal
Julien, Cedric
Verheijen, Marcel
Issue Date: 2018
Publisher: MDPI
Citation: APPLIED SCIENCES-BASEL, 8(7) (Art N° 1064)
Abstract: Both in design and production of nanoparticles and nanocomposites it is of vital importance to have information about their size and concentration. During the formation of nanoparticles, real-time monitoring of particle size and concentration during bottom-up synthesis in liquids allows for a detailed study of nucleation and growth. This provides valuable insights into the formation of nanoparticles that can be used for process optimization and scale up. In the production of nanoparticles, real-time monitoring enables intervention to minimize the number of off-spec batches. In this paper we will qualify an ultrasound nanoparticle sizer (UNPS) as a real-time monitor for the growth of nanoparticles (or sub-micro particles) in the 100 nm(-1) mu m range. Nanoparticles affect the speed and attenuation of ultrasonic waves in the dispersion. The size of the change depends, amongst other things, on the size and concentration of the nanoparticles. This dependency is used in the UNPS method. The qualification of the UNPS was undertaken in two successful experiments. The first experiment consisted of static measurements on commercially available silica particles, and the second experiment was real-time monitoring of the size and concentration during the growth of silica nanoparticles in Stober synthesis in a water-alcohol mixture starting from the molecular precursor tetraethyl orthosilicate. The results of the UNPS were verified by measurements of a dynamic light scattering device and a transmission electron microscope.
Notes: [van Groenestijn, Gert Jan; Volker, Arno; van Neer, Paul] Netherlands Org Appl Sci Res TNO, Oude Waalsdorperweg 63, NL-2597 AK The Hague, Netherlands. [Meulendijks, Nicole; van Ee, Renz; Buskens, Pascal] Netherlands Org Appl Sci Res TNO, High Tech Campus 25, NL-5656 AE Eindhoven, Netherlands. [van Neer, Paul] Delft Univ Technol, Appl Phys, Lorentzweg 1, NL-2628 CJ Delft, Netherlands. [Buskens, Pascal] Hasselt Univ, Inst Mat Res Inorgan & Phys Chem, Agoralaan Bldg D, B-3590 Diepenbeek, Belgium. [Buskens, Pascal] Zuyd Univ Appl Sci, Nieuw Eyckholt 300,Postbus 550, NL-6400 AN Heerlen, Netherlands. [Julien, Cedric] Independent Software Developer, F-70140 Montagney, France. [Verheijen, Marcel] Philips Innovat Labs, High Tech Campus 11, NL-5656 AE Eindhoven, Netherlands. [Verheijen, Marcel] Eindhoven Univ Technol, Dept Appl Phys, POB 513, NL-5600 MB Eindhoven, Netherlands.
URI: http://hdl.handle.net/1942/28707
DOI: 10.3390/app8071064
ISI #: 000441814300054
ISSN: 2076-3417
Category: A1
Type: Journal Contribution
Appears in Collections: Research publications

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