www.uhasselt.be
DSpace

Document Server@UHasselt >
Research >
Research publications >

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2857

Title: In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions
Authors: D'HAEN, Jan
VAN OLMEN, Jan
Beelen, Z.
MANCA, Jean
MARTENS, Tom
DE CEUNINCK, Ward
D'OLIESLAEGER, Marc
DE SCHEPPER, Luc
Cannaerts, M
Maex, K
Issue Date: 2000
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Citation: MICROELECTRONICS RELIABILITY, 40(8-10). p. 1407-1412
Abstract: With so-called in-situ SEM experiments, electromigration experiments are performed in a SEM (scanning electron microscope) equipped with a heating stage. BSE (back scattered electron) images are taken continuously over the entire length of a metal line submitted to high current and temperature stress, monitoring in detail the microstructure. Comparing the electrical resistance curves with the corresponding SEM micrographs and with ex-situ AFM measurements leads to detailed qualitative and quantitative information about the occurring electromigration and precipitation / dissolution effects in the metal lines. (C) 2000 Elsevier Science Ltd. All rights reserved.
Notes: Limburgs Univ Ctr, Inst Mat Res, B-3590 Diepenbeek, Belgium. Katholieke Univ Leuven, B-3001 Heverlee, Belgium. IMEC, B-3001 Heverlee, Belgium.d'Haen, J, Limburgs Univ Ctr, Inst Mat Res, Wetenschapspk, B-3590 Diepenbeek, Belgium.
URI: http://hdl.handle.net/1942/2857
DOI: 10.1016/S0026-2714(00)00170-0
ISI #: 000089532800028
ISSN: 0026-2714
Category: A1
Type: Journal Contribution
Validation: ecoom, 2001
Appears in Collections: Research publications

Files in This Item:

There are no files associated with this item.

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.