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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/26539

Title: Triboenvironment Dependent Chemical Modification of Sliding Interfaces in Ultrananocrystalline Diamond Nanowall Film: Correlation with Friction and Wear
Authors: Rani, Revati
Panda, Kalpataru
Kumar, Niranjan
Kamatchi Jothiramalingam, Sankaran
Pandian, Ramanathaswamy
Ficek, Mateusz
Bogdanowicz, Robert
Haenen, Ken
I-Nan, Lin
Issue Date: 2018
Publisher: AMER CHEMICAL SOC
Citation: JOURNAL OF PHYSICAL CHEMISTRY C, 122(1), p. 945-956
Abstract: Tribological properties of ultrananocrystalline diamond nanowall (UNCD NW) films were investigated quantitatively in three different and controlled triboenvironmental conditions, proposing the passivation and graphitization mechanisms. However, these mechanisms are rather complicated and possibly can be understood in well-controlled tribological conditions. It was shown that the friction and wear of these films were high in high-vacuum and room temperature (HV-RT) tribo conditions where the passivation of carbon dangling bonds were restricted and frictional shear-induced transformation of sp(3) carbon into amorphous carbon (a-C) and tetrahedral amorphous carbon (t-aC) were noticed. However, the friction coefficients were reduced to the ultralow value in ambient atmospheric and room temperature (AA-RT) tribo conditions. Here, both passivation of dangling bonds through atmospheric water vapor and graphitization of the contact interfaces were energetically favorable mechanisms. Furthermore, the conversion of diamond sp(3) into hydrogenated-graphitized phase was the dominating mechanism for the observed superlow friction coefficient and ultrahigh wear resistance of films in high-vacuum and high temperature (HV-HT) tribo conditions. These mechanisms were comprehensively investigated by micro-Raman and X-ray photoelectron spectroscopy analyses of the sliding interfaces.
Notes: [Rani, Revati; Kumar, Niranjan; Pandian, Ramanathaswamy] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India. [Rani, Revati; Kumar, Niranjan] Indira Gandhi Ctr Atom Res, HBNI, Kalpakkam 603102, Tamil Nadu, India. [Panda, Kalpataru] Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Daejeon 305701, South Korea. [Sankaran, Kamatchi Jothiramalingam; Haenen, Ken] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Sankaran, Kamatchi Jothiramalingam; Haenen, Ken] IMEC VZW, IMOMEC, B-3590 Diepenbeek, Belgium. [Ficek, Mateusz; Bogdanowicz, Robert] Gdansk Univ Technol, Fac Elect Telecommun & Informat, Dept Metrol & Optoelect, 11-12 G Narutowicza St, PL-80233 Gdansk, Poland. [I-Nan, L.] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan.
URI: http://hdl.handle.net/1942/26539
DOI: 10.1021/acs.jpcc.7b10992
ISI #: 000422814200102
ISSN: 1932-7447
Category: A1
Type: Journal Contribution
Appears in Collections: Research publications

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