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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/25575

Title: 2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization
Authors: Laun, Joachim
De Smet, Yana
Van de Reydt, Emma
Krivcov, Alexander
Trouillet, Vanessa
Welle, Alexander
Möbius, Hildegard
Barner-Kowollik, Christopher
Junkers, Tanja
Issue Date: 2018
Citation: CHEMICAL COMMUNICATIONS, 54(7), p. 751-754
Abstract: A 2D laser lithography protocol for controlled grafting of polymer brushes in a single-step is presented. A series of polyacrylates were grafted from silicon substrates via laser-induced copper-mediated radical polymerization. Film thicknesses up to 39 nm were reached within 125 μs of exposure to UV laser light (351 nm). Successful block copolymerization underpinned the controlled nature of the grafting methodology. The resolution of a small structure of grafted PHEA reached 270 μm and was limited by the type of laser used in the study. Further, a checkerboard pattern of PtBA and POEGA was produced and imaged via time-of-flight secondary ion mass spectrometry (ToF-SIMS), and X-ray photoelectron spectroscopy (XPS).
URI: http://hdl.handle.net/1942/25575
DOI: 10.1039/c7cc08444g
ISI #: 000422989400011
ISSN: 1359-7345
Category: A1
Type: Journal Contribution
Appears in Collections: Research publications

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