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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/24165

Title: Microplasma device architectures with various diamond nanostructures
Authors: Kunuku, Srinivasu
Kamatchi Jothiramalingam, Sankaran
Leou, Keh-Chyang
Lin, I-Nan
Issue Date: 2017
Publisher: IOP PUBLISHING LTD
Citation: MATERIALS RESEARCH EXPRESS, 4(2), p. 1-13 (Art N° 025001)
Abstract: Diamond nanostructures (DNSs) were fabricated from three different morphological diamonds, microcrystalline diamond (MCD), nanocrystalline diamond (NCD), and ultrananocrystalline diamond (UNCD) films, using a reactive ion etching method. The plasma illumination ( PI) behavior of microplasma devices using the DNSs and the diamond films as cathode were investigated. The Paschen curve approach revealed that the secondary electron emission coefficient (gamma value) of diamond materials is similar irrespective of the microstructure (MCD, NCD, and UNCD) and geometry of the materials (DNSs and diamond films). The diamond materials show markedly larger gamma-coefficient than conventional metallic cathode materials such as Mo that resulted in markedly better PI behavior for the corresponding microplasma devices. Moreover, the PI behavior, i.e. the voltage dependence of plasma current density (J(pl)-V), plasma density (n(e)-V), and the robustness of the devices, varied markedly with the microstructure and geometry of the cathode materials that was closely correlated to the electron field emission (EFE) properties of the cathode materials. The UNCD nanopillars, possessing good EFE properties, resulted in superior PI behavior, whereas the MCD diamond films with insufficient EFE properties led to inferior PI behavior. Consequently, enhancement of plasma characteristics is the collective effects of EFE behavior and secondary electron emission characteristics of diamond-based cathode materials.
Notes: [Kunuku, Srinivasu; Leou, Keh-Chyang] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan. [Sankaran, Kamatchi Jothiramalingam] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Sankaran, Kamatchi Jothiramalingam] IMEC VZW, IMOMEC, Diepenbeek, Belgium. [Lin, I-Nan] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan.
URI: http://hdl.handle.net/1942/24165
DOI: 10.1088/2053-1591/4/2/025001
ISI #: 000395782400001
ISSN: 2053-1591
Category: A1
Type: Journal Contribution
Appears in Collections: Research publications

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