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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2416

Title: Direct patterning of photosensitive chemical solution deposition PZT layers
Authors: Marson, S
Dorey, RA
Zhang, Q
Whatmore, RW
Issue Date: 2004
Citation: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928
Abstract: A highly concentrated solution for producing photopatternable layers of lead zirconate titanate (PZT) was prepared by dissolving into acrylic acid an amorphous PZT powder which was obtained by a sol-gel process. The solution was found to be suitable for spin-coating PZT layers that are photosensitive to UV radiation. After deposition and subsequent exposure the PZT film showed a decreased solubility in several organic compounds. These properties were exploited to create features on platinised silicon (Si) substrates. A thermogravimetric analysis was performed on the solution to determine the best thermal profile for the burn out of the organics. PZT features up to 2 mum thick were obtained after the firing process. (C) 2003 Elsevier Ltd. All rights reserved.
Notes: Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England. Limburgs Univ Ctr, Lab Inorgan & Phys Chem, Diepenbeek, Belgium.Dorey, RA, Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England.r.a.dorey@cranfield.ac.uk
URI: http://hdl.handle.net/1942/2416
DOI: 10.1016/S0955-2219(03)00543-0
ISI #: 000189247800205
ISSN: 0955-2219
Category: A1
Type: Journal Contribution
Validation: ecoom, 2005
Appears in Collections: Research publications

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