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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/21663

Title: Disordered nanostructures by hole-mask colloidal lithography for advanced light trapping in silicon solar cells
Authors: Trompoukis, Christos
Massiot, Inès
Depauw, Valérie
El Daif, Ounsi
Lee, Kidong
Dmitriev, Alexandre
Gordon, Ivan
Mertens, Robert
Poortmans, Jef
Issue Date: 2016
Publisher: OPTICAL SOC AMER
Citation: OPTICS EXPRESS, 24 (2), p. A191-A201
Abstract: We report on the fabrication of disordered nanostructures by combining colloidal lithography and silicon etching. We show good control of the short-range ordered colloidal pattern for a wide range of bead sizes from 170 to 850 nm. The inter-particle spacing follows a Gaussian distribution with the average distance between two neighboring beads (center to center) being approximately twice their diameter, thus enabling the nanopatterning with dimensions relevant to the light wavelength scale. The disordered nanostructures result in a lower integrated reflectance (8.1%) than state-of-the-art random pyramid texturing (11.7%) when fabricated on 700 mu m thick wafers. When integrated in a 1.1 mu m thin crystalline silicon slab, the absorption is enhanced from 24.0% up to 64.3%. The broadening of resonant modes present for the disordered nanopattern offers a more broadband light confinement compared to a periodic nanopattern. Owing to its simplicity, versatility and the degrees of freedom it offers, this potentially low-cost bottom-up nanopatterning process opens perspectives towards the integration of advanced light-trapping schemes in thin solar cells. (C) 2015 Optical Society of America
Notes: [Trompoukis, Christos; Depauw, Valerie; El Daif, Ounsi; Gordon, Ivan; Mertens, Robert; Poortmans, Jef] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium. [Trompoukis, Christos; Poortmans, Jef] Katholieke Univ Leuven, Dept Elektrotech ESAT, Kasteelpark Arenberg 10, B-3001 Leuven, Belgium. [Massiot, Ines; Dmitriev, Alexandre] Chalmers, Dept Appl Phys, SE-41296 Gothenburg, Sweden. [Lee, Kidong] Obducat Technol AB, Scheelevagen 2, S-22363 Lund, Sweden. [Poortmans, Jef] Univ Hasselt, Martelarenlaan 42, B-3500 Hasselt, Belgium. [Trompoukis, Christos] Univ Ghent, Dept Informat Technol, Photon Res Grp, Sint Pietersnieuwstr 41, B-9000 Ghent, Belgium. [Trompoukis, Christos] Katholieke Univ Leuven, Ctr Surface Chem & Catalysis, Celestijnenlaan 200F Leuven Chem & Tech Post, B-3001 Leuven, Belgium. [El Daif, Ounsi] QEERI, Doha 5825, Qatar.
URI: http://hdl.handle.net/1942/21663
DOI: 10.1364/OE.24.00A191
ISI #: 000369066300020
ISSN: 1094-4087
Category: A1
Type: Journal Contribution
Validation: ecoom, 2017
Appears in Collections: Research publications

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