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|Title: ||CVD diamond-Research, applications, and challenges|
|Authors: ||Nemanich, Robert J.|
Carlisle, John A.
|Issue Date: ||2014|
|Publisher: ||CAMBRIDGE UNIV PRESS|
|Citation: ||MRS BULLETIN, 39 (6), p. 490-498|
|Abstract: ||Diamond is a unique material that often exhibits extreme properties compared to other materials. Discovered about 30 years ago, the use of hydrogen in plasma-enhanced chemical vapor deposition (CVD) has enabled the growth and coating of diamond in film form on various substrate materials. CVD diamond research has been actively continued subsequently to develop new understanding and approaches for the growth and processing of this fascinating material. Currently, the study and development of diamond films has enabled a wide range of applications based on the combination of unique and extreme properties of diamond and the variety of film properties obtainable through tuning the microstructure, morphology, impurities, and surfaces. This issue of MRS Bulletin introduces the latest research, recent applications, and the challenges ahead for CVD diamond films.|
|Notes: ||[Nemanich, Robert J.] Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA. [Carlisle, John A.] Adv Diamond Technol Inc, Romeoville, IL USA. [Hirata, Atsushi] Tokyo Inst Technol, Dept Mech Sci & Engn, Tokyo, Japan. [Haenen, Ken] Hasselt Univ, Inst Mat Res, Diepenbeek, Belgium. [Haenen, Ken] Hasselt Univ, IMOMEC, Diepenbeek, Belgium. [Haenen, Ken] IMEC vzw, Diepenbeek, Belgium.|
|ISI #: ||000337331500011|
|Type: ||Journal Contribution|
|Validation: ||ecoom, 2015|
|Appears in Collections: ||Research publications|
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