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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/1459

Title: Plasma deposition of thiophene derivatives under atmospheric pressure
Authors: DAMS, Roel
Issue Date: 2006
Publisher: Wiley
Citation: CHEMICAL VAPOR DEPOSITION, 12(12). p. 719-727
Abstract: Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured.
URI: http://hdl.handle.net/1942/1459
DOI: 10.1002/cvde.200606483
ISI #: 000243466000005
ISSN: 0948-1907
Category: A1
Type: Journal Contribution
Validation: ecoom, 2008
Appears in Collections: Research publications

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