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|Title: ||Compositional and electrical characterisation of the hydrogen-oxygen terminated diamond (100) surface|
|Authors: ||DEFERME, Wim|
|Issue Date: ||2006|
|Citation: ||PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 203(12). p. 3114-3120|
|Abstract: ||In this work (100) diamond films are hydrogenated using a conventional MWPE-CVD (microwave plasma enhanced chemical vapour deposition) reactor containing a H2 or a H2/O2 mixture. For the latter, XPS (X-ray Photoelectron Spectroscopy) experiments show an increased presence of oxygen at the (sub)-surface. Contrary to pure H2-plasma treated samples, H2/O2-treated layers still posses enough conductivity to enable STS (Scanning Tunneling Spectroscopy) investigations to be carried out after an annealing at 410 °C in UHV (Ultra High Vacuum). Evidence for surface resonance states is detected, yielding a possible explanation for the measured conductivity. UPS (UV Photoelectron Spectroscopy) data point to a negative electron affinity of -0.3 eV for the H2/O2-treated layers.|
|ISI #: ||000240967400020|
|Type: ||Journal Contribution|
|Validation: ||ecoom, 2007|
|Appears in Collections: ||Research publications|
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