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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/1431

Title: Compositional and electrical characterisation of the hydrogen-oxygen terminated diamond (100) surface
Authors: DEFERME, Wim
HAENEN, Ken
Tanasa, G.
Flipse, C.F.J.
NESLADEK, Milos
Issue Date: 2006
Publisher: Wiley
Citation: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 203(12). p. 3114-3120
Abstract: In this work (100) diamond films are hydrogenated using a conventional MWPE-CVD (microwave plasma enhanced chemical vapour deposition) reactor containing a H2 or a H2/O2 mixture. For the latter, XPS (X-ray Photoelectron Spectroscopy) experiments show an increased presence of oxygen at the (sub)-surface. Contrary to pure H2-plasma treated samples, H2/O2-treated layers still posses enough conductivity to enable STS (Scanning Tunneling Spectroscopy) investigations to be carried out after an annealing at 410 °C in UHV (Ultra High Vacuum). Evidence for surface resonance states is detected, yielding a possible explanation for the measured conductivity. UPS (UV Photoelectron Spectroscopy) data point to a negative electron affinity of -0.3 eV for the H2/O2-treated layers.
URI: http://hdl.handle.net/1942/1431
DOI: 10.1002/pssa.200671125
ISI #: 000240967400020
ISSN: 0031-8965
Category: A1
Type: Journal Contribution
Validation: ecoom, 2007
Appears in Collections: Research publications

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