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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/13957

Title: Anisotropic Atomic Layer Deposition Profiles of TiO2 in Hierarchical Silica Material with Multiple Porosity
Authors: Sree, Sreeprasanth Pulinthanathu
Dendooven, Jolien
Jammaer, Jasper
Masschaele, Kasper
Deduytsche, Davy
D'HAEN, Jan
Kirschhock, Christine E. A.
Martens, Johan A.
Detavernier, Christophe
Issue Date: 2012
Publisher: AMER CHEMICAL SOC
Citation: CHEMISTRY OF MATERIALS, 24 (14), p. 2775-2780
Abstract: Anisotropic deposition profiles of TiO2 in Zeotile-4 ordered mesoporous silica material are obtained using Atomic Layer Deposition (ALD) involving alternating pulses of tetrakis(dimethylamino) titanium (TDMAT) and water. TiO2 concentration profiles visualized by transmission electron microscopy (TEM) on particle cross sections reveal the systematic deeper penetration of the deposition front along the main channels and the more limited penetration in the perpendicular direction through the narrower slit-like mesopores. In ordered mesoporous material with one-dimensional pore system ALD leads to pore plugging. Diffusion limited ALD is shown to be useful for TiO2 deposition in anisotropic mesoporous support materials.
Notes: [Sree, Sreeprasanth Pulinthanathu; Jammaer, Jasper; Masschaele, Kasper; Kirschhock, Christine E. A.; Martens, Johan A.] Katholieke Univ Leuven, Ctr Surface Chem & Catalysis, B-3001 Louvain, Belgium. [Dendooven, Jolien; Deduytsche, Davy; Detavernier, Christophe] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium. [D'Haen, Jan] Univ Hasselt, IMO IMOMEC, Diepenbeek, Belgium. Johan.Martens@biw.kuleuven.be
URI: http://hdl.handle.net/1942/13957
DOI: 10.1021/cm301205p
ISI #: 000306674200021
ISSN: 0897-4756
Category: A1
Type: Journal Contribution
Validation: ecoom, 2013
Appears in Collections: Research publications

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