Document Server@UHasselt >
Research >
Research publications >

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/13806

Title: Dewetting of Patterned Silicon Substrates Leading to a Selective Deposition of Micellar-Based Nanoparticles
Authors: Riskin, Alexander
De Dobbelaere, Christopher
Shan, Lianchen
Boyen, Hans-Gerhard
D'Haen, Jan
Hardy, An
Van Bael, Marlies K.
Issue Date: 2012
Citation: JOURNAL OF PHYSICAL CHEMISTRY C, 116 (19), p. 10743-10752
Abstract: We have applied soft lithography for the indirect patterning of micellar poly(styrene-b-2-vinyl pyridine) diblock copolymers loaded with gold chloric acid with a pattern width below a micrometer. A combination of physical and chemical heterogeneities on the substrate induced a selective deposition of the micelles in between the relief structures without the need for additional liftoff or annealing steps. Micelle size, dip coating speed, and height of the relief pattern were identified as important parameters to achieve a successful selective deposition. Finally, a single layer of patterned gold nanoparticles was formed inside the micropattern using an oxygen plasma treatment.
Notes: [Riskin, A.; De Dobbelaere, C.; Shan, L.; Boyen, H. G.; D'Haen, J.; Hardy, A.; van Bael, M. K.] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium. [Shan, L.; Boyen, H. G.; D'Haen, J.; van Bael, M. K.] Imec Vzw Div IMOMEC, B-3590 Diepenbeek, Belgium.
URI: http://hdl.handle.net/1942/13806
DOI: 10.1021/jp211775q
ISI #: 000304073700038
ISSN: 1932-7447
Category: A1
Type: Journal Contribution
Validation: ecoom, 2013
Appears in Collections: Research publications

Files in This Item:

Description SizeFormat
N/A6.33 MBAdobe PDF

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.