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|Title: ||Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in situ capping|
|Authors: ||Swerts, J.|
VAN BAEL, Marlies
Van Elshocht, S.
|Issue Date: ||2011|
|Publisher: ||AMER INST PHYSICS|
|Citation: ||APPLIED PHYSICS LETTERS, 98(10)|
|Abstract: ||We have studied the effect of air exposure on lanthanum aluminates (LaAlOx) deposited by atomic layer deposition. Fourier transform infrared spectroscopy and thermal desorption spectroscopy of as-deposited LaAlOx showed that H2O is absorbed during air exposure and that the amount of absorbed H2O increases with increasing La atomic percent. C was found to be incorporated already during deposition in the form of carbonates. H2O and CO2 are outgassed during postdeposition annealing in an inert atmosphere. After a 700 degrees C postdeposition anneal, the LaAlOx becomes resistant against H2O absorption due to film densification. Alternatively, in situ capping of the LaAlOx with a similar to 2 nm thin Al2O3 film protects the LaAlOx against H2O absorption, but it also hinders the outgassing of the C contaminants during a postdeposition anneal. (C) 2011 American Institute of Physics. [doi:10.1063/1.3557501]|
|Notes: ||[Swerts, J.; Gielis, S.; Vereecke, G.; Adelmann, C.; Van Elshocht, S.] IMEC VZW, B-3001 Louvain, Belgium. [Gielis, S.] Katholieke Univ Leuven, Dept Chem, B-3001 Louvain, Belgium. [Hardy, A.; Dewulf, D.; Van Bael, M. K.] Hasselt Univ, IMO, Div IMOMEC, B-3590 Diepenbeek, Belgium. [Hardy, A.; Dewulf, D.; Van Bael, M. K.] Hasselt Univ, IMEC, Div IMOMEC, B-3590 Diepenbeek, Belgium.|
|ISI #: ||000288277200058|
|Type: ||Journal Contribution|
|Validation: ||ecoom, 2012|
|Appears in Collections: ||Research publications|
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