Document Server@UHasselt >
Research >
Research publications >

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/11047

Title: Apparent and steady-state etch rates in thin film etching and under-etching of microstructures: II. Characterization
Authors: Van Barel, Gregory
Du Bois, Bert
Van Hoof, Rita
De Wachter, Jef
De Ceuninck, Ward
Witvrouw, Ann
Issue Date: 2010
Abstract: The apparent and steady-state etch rates of PECVD SiO2, HDP SiO2 and PECVD Si3N4 are measured both in a single thin film and a stacked film configuration. This is done for a HF:H2O/1:1, a HF49 wt%: IPA/1:1 and a BHF solution. It is shown that etch rates vary with the used etch time, confirming the influence of both an incubation and a rinsing period on the average etch rate when performing typical ex situ etch rate experiments. Hence, this second part of a set of two papers provides the experimental evidence for part I where a general etch rate model was proposed. Furthermore this work shows that the etch rate varies whether it is determined on a single layer, in a stacked configuration or while under-etching a structural layer. This confirms the need of a straightforward characterization method for under-etching measurements at the sacrificial release stage of MEMS fabrication processes. Therefore, a new characterization method, using a suspended beam array and a surface profilometer, is proposed to determine the amount of under-etch after sacrificial release of surface micromachined devices.
Notes: [De Wachter, Jef] Karel de Grote Univ Coll, KdG, B-2660 Hoboken, Belgium. [Van Barel, Gregory; Du Bois, Bert; Van Hoof, Rita; Witvrouw, Ann] IMEC VZW, Interuniv Microelect Ctr, B-3001 Louvain, Belgium. [Van Barel, Gregory; De Ceuninck, Ward] Hasselt Univ, Div Mat Phys, B-3590 Diepenbeek, Belgium. Gregory.VanBarel@kdg.be; Ann.Witvrouw@imec.be
URI: http://hdl.handle.net/1942/11047
DOI: 10.1088/0960-1317/20/5/055034
ISI #: 000277305000034
ISSN: 0960-1317
Category: A1
Type: Journal Contribution
Validation: ecoom, 2011
Appears in Collections: Research publications

Files in This Item:

There are no files associated with this item.

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.