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Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/11039

Title: Apparent and steady-state etch rates in thin film etching and under-etching of microstructures: I. Modelling
Authors: Van Barel, Gregory
Mertens, Luc
De Ceuninck, Ward
Witvrouw, Ann
Issue Date: 2010
Abstract: A general etch rate model is proposed that allows accurate etch rate calculations out of typical ex situ etch rate experiments. This model takes into account the influence of an incubation period during the initial stage of the etching process and the influence of a decreasing etch rate during the rinsing period. Expressions for the apparent etch rate and steady-state etch rate are proposed. This paper is the first part of a set of two. In part II, experimental etch data are obtained, confirming the proposed etch rate model in this work.
Notes: [Mertens, Luc] Karel de Grote Univ Coll, KdG, B-2660 Hoboken, Belgium. [Van Barel, Gregory; Witvrouw, Ann] IMEC VZW, Interuniv Microelect Ctr, B-3001 Louvain, Belgium. [Van Barel, Gregory; De Ceuninck, Ward] Hasselt Univ, Div Mat Phys, B-3590 Diepenbeek, Belgium.
URI: http://hdl.handle.net/1942/11039
DOI: 10.1088/0960-1317/20/5/055033
ISI #: 000277305000033
ISSN: 0960-1317
Category: A1
Type: Journal Contribution
Validation: ecoom, 2011
Appears in Collections: Research publications

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